发明授权
- 专利标题： Pattern forming method and method of processing a structure by use of same
- 专利标题（中）： 图案形成方法及其结构的处理方法
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申请号： US11248587申请日： 2005-10-13
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公开(公告)号： US07618675B2公开(公告)日： 2009-11-17
- 发明人: Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
- 申请人： Hiroyuki Hieda , Naoko Kihara , Katsuyuki Naito
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Nixon & Vanderhye P.C.
- 优先权： JP2004-298926 20041013
- 主分类号： B05D1/34
- IPC分类号： B05D1/34
摘要：
The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.
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