发明授权
US07620093B2 Laser device, laser module, semiconductor laser and fabrication method of semiconductor laser 有权
激光器件,激光器模块,半导体激光器和半导体激光器的制造方法

  • 专利标题: Laser device, laser module, semiconductor laser and fabrication method of semiconductor laser
  • 专利标题(中): 激光器件,激光器模块,半导体激光器和半导体激光器的制造方法
  • 申请号: US11616530
    申请日: 2006-12-27
  • 公开(公告)号: US07620093B2
    公开(公告)日: 2009-11-17
  • 发明人: Takuya Fujii
  • 申请人: Takuya Fujii
  • 申请人地址: JP Yamanashi
  • 专利权人: Eudyna Devices Inc.
  • 当前专利权人: Eudyna Devices Inc.
  • 当前专利权人地址: JP Yamanashi
  • 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
  • 优先权: JP2005-376050 20051227; JP2006-316887 20061124
  • 主分类号: H01S3/08
  • IPC分类号: H01S3/08
Laser device, laser module, semiconductor laser and fabrication method of semiconductor laser
摘要:
A semiconductor laser has first and second diffractive grating regions. The first diffractive grating region has segments, has a gain, and has first discrete peaks of a reflection spectrum. The second diffractive grating region has segments combined to each other, and has second discrete peaks of a reflection spectrum. Each segment has a diffractive grating and a space region. Pitches of the diffractive grating are substantially equal to each other. A wavelength interval of the second discrete peaks is different from that of the first discrete peaks. A part of a given peak of the first discrete peaks is overlapped with that of the second discrete peaks when a relationship between the given peaks of the first discrete peaks and the second discrete peaks changes. A first segment located in the first diffractive grating region or the second diffractive grating region has an optical length shorter or longer than the other segments of the first diffractive grating region and the second diffractive grating region by odd multiple of half of the pitch of the diffractive grating of the first diffractive grating region.
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