发明授权
- 专利标题: Exposure device
- 专利标题(中): 曝光装置
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申请号: US12079435申请日: 2008-03-27
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公开(公告)号: US07622720B2公开(公告)日: 2009-11-24
- 发明人: Jun Nonaka , Duk Lee , Yoshinori Kobayashi
- 申请人: Jun Nonaka , Duk Lee , Yoshinori Kobayashi
- 申请人地址: JP Tokyo
- 专利权人: ORC Maufacturing Co., Ltd.
- 当前专利权人: ORC Maufacturing Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Dilworth & Barrese LLP
- 优先权: JP2007-083881 20070328
- 主分类号: G01J1/42
- IPC分类号: G01J1/42
摘要:
The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.
公开/授权文献
- US20080258069A1 Exposure device 公开/授权日:2008-10-23
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