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    Exposure device
    1.
    发明申请
    Exposure device 有权
    曝光装置

    公开(公告)号：US20080258069A1

    公开(公告)日：2008-10-23

    申请号：US12079435

    申请日：2008-03-27

    申请人： Jun Nonaka ,  Duk Lee ,  Yoshinori Kobayashi

    发明人： Jun Nonaka ,  Duk Lee ,  Yoshinori Kobayashi

    IPC分类号： G01J1/42

    CPC分类号： G03F7/70291 ,  G03F7/70275

    摘要： The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.

    摘要翻译： 本发明涉及一种将预定图案形成在物体上的曝光装置。 曝光装置包括用于发射光线的光源，包括第一和第二开口窗口的孔径构件和检测窗口，用于反射已经穿过第一和第二开口窗口的第一和第二光束的第一和第二反射光学元件 和用于检测来自已经通过检测窗口的光源的光线强度的光学传感器，光学传感器靠近第一和第二反射光学元件之间的区域放置。

    Exposure device
    2.
    发明授权
    Exposure device 有权
    曝光装置

    公开(公告)号：US07622720B2

    公开(公告)日：2009-11-24

    申请号：US12079435

    申请日：2008-03-27

    申请人： Jun Nonaka ,  Duk Lee ,  Yoshinori Kobayashi

    发明人： Jun Nonaka ,  Duk Lee ,  Yoshinori Kobayashi

    IPC分类号： G01J1/42

    CPC分类号： G03F7/70291 ,  G03F7/70275

    摘要： The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.

    摘要翻译： 本发明涉及一种将预定图案形成在物体上的曝光装置。 曝光装置包括用于发射光线的光源，包括第一和第二开口窗口的孔径构件和检测窗口，用于反射已经穿过第一和第二开口窗口的第一和第二光束的第一和第二反射光学元件 和用于检测来自已经通过检测窗口的光源的光线强度的光学传感器，光学传感器靠近第一和第二反射光学元件之间的区域放置。

    Laser drawing apparatus and method for adjusting the same
    3.
    发明授权
    Laser drawing apparatus and method for adjusting the same 失效
    激光拉丝装置及其调整方法

    公开(公告)号：US5805198A

    公开(公告)日：1998-09-08

    申请号：US279745

    申请日：1994-07-22

    申请人： Jun Nonaka ,  Shuichi Shimizu ,  Satoru Kobayashi

    发明人： Jun Nonaka ,  Shuichi Shimizu ,  Satoru Kobayashi

    IPC分类号： B23K26/00 ,  B23K26/067 ,  B41J2/47 ,  G02B26/10 ,  G02B26/12 ,  G02B27/28 ,  G03F7/20 ,  G01D15/14 ,  G02B26/00 ,  G02B27/00

    CPC分类号： B23K26/0613 ,  B23K26/067 ,  B41J2/471 ,  G02B26/123 ,  G03F7/2053

    摘要： A laser drawing apparatus is provided including a splitting means for splitting laser light emitted from a laser source into at least two groups of drawing beams, the beams of each group being aligned in a common plane; a scanning means for scanning a drawing surface with said at least two groups of drawing beams in a main scanning direction; a first adjusting means for rotating the common plane, in which one of the at least two bundles of drawing beams are aligned, about an axis extending parallel to the drawing beams; a second adjusting means for moving at least one of the at least two groups of drawing beams in said main scanning direction of the scanning means; and, a third adjusting means for moving at least one of the at least two groups of drawing beams in a sub-scanning direction perpendicular to the main scanning direction.

    摘要翻译： 提供了一种激光绘制装置，其包括：分离装置，用于将从激光源发射的激光分成至少两组绘制光束，每组的光束在公共平面中对准; 扫描装置，用于沿主扫描方向用所述至少两组绘图光束扫描绘图面; 第一调节装置，用于旋转所述公共平面，所述公共平面中的至少两束拉伸梁中的一个绕平行于所述拉伸梁延伸的轴线对齐; 第二调节装置，用于沿所述扫描装置的所述主扫描方向移动所述至少两组牵引波束中的至少一个; 以及第三调节装置，用于在垂直于主扫描方向的副扫描方向上移动所述至少两组牵引波束中的至少一个。

    LIQUID PROCESSING METHOD AND LIQUID PROCESSING APPARATUS
    4.
    发明申请
    LIQUID PROCESSING METHOD AND LIQUID PROCESSING APPARATUS 有权
    液体加工方法和液体加工设备

    公开(公告)号：US20120260952A1

    公开(公告)日：2012-10-18

    申请号：US13443057

    申请日：2012-04-10

    申请人： Jun Nonaka

    发明人： Jun Nonaka

    IPC分类号： B08B3/04

    CPC分类号： H01L21/67034 ,  H01L21/02052 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715

    摘要： A surface of a substrate can be dried cleanly after liquid-processed by a liquid processing method and a liquid processing apparatus. The liquid processing method includes forming a liquid film of a rinse solution on an entire surface of a substrate having thereon a hydrophobic region by supplying, onto a central portion of the surface of the substrate, the rinse solution for rinsing a chemical liquid supplied on the substrate at a first flow rate while rotating the substrate at a first rotation speed; forming a stripe-shaped flow of the rinse solution on the surface of the substrate by breaking the liquid film formed on the entire surface of the substrate; and moving a discharge unit configured to supply the rinse solution toward a periphery of the substrate until the stripe-shaped flow of the rinse solution is moved outside the surface of the substrate.

    摘要翻译： 通过液体处理方法和液体处理装置进行液体处理后，可以清洁基板的表面。 液体处理方法包括在其上具有疏水性区域的基板的整个表面上形成冲洗溶液的液膜，在基板的表面的中心部分上，供给冲洗液 基板以第一流速旋转，同时以第一转速旋转基板; 通过破坏形成在基板的整个表面上的液膜，在基板的表面上形成冲洗液的条状流; 并移动排出单元，该排出单元构造成朝向基板的周边供应冲洗溶液，直到冲洗溶液的条状流动移动到基板的表面之外。

    Drawing surface adjusting mechanism for use with scanning pattern drawing apparatus
    8.
    发明授权
    Drawing surface adjusting mechanism for use with scanning pattern drawing apparatus 失效
    用于扫描图案绘图装置的绘图表面调整机构

    公开(公告)号：US5027137A

    公开(公告)日：1991-06-25

    申请号：US444243

    申请日：1989-12-01

    申请人： Hiroaki Andoh ,  Michio Ohshima ,  Yuji Matsui ,  Takashi Okuyama ,  Toshitaka Yoshimura ,  Hidetaka Yamaguchi ,  Yasushi Ikeda ,  Jun Nonaka ,  Tamihiro Miyoshi ,  Mitsuo Kakimoto ,  Masatoshi Iwama ,  Hideyuki Morita ,  Satoru Tachihara ,  Akira Morimoto ,  Akira Ohwaki

    发明人： Hiroaki Andoh ,  Michio Ohshima ,  Yuji Matsui ,  Takashi Okuyama ,  Toshitaka Yoshimura ,  Hidetaka Yamaguchi ,  Yasushi Ikeda ,  Jun Nonaka ,  Tamihiro Miyoshi ,  Mitsuo Kakimoto ,  Masatoshi Iwama ,  Hideyuki Morita ,  Satoru Tachihara ,  Akira Morimoto ,  Akira Ohwaki

    IPC分类号： B41J2/44 ,  B23K26/00 ,  B23K26/08 ,  G03B27/34 ,  G03B27/50 ,  G03F7/20

    CPC分类号： G03F7/20

    摘要： A drawing surface adjusting mechanism for use with a scanning pattern drawing apparatus capable of not only moving a drawing board in a vertical direction but also tilting it, whereby the chance of bringing the drawing surface within the depth of focus of a scanning lens is increased even if the drawing surface has waviness or other flaws within the width of a single storke of scanning. The drawing surface adjusting mechanism of the invention includes a drawing board for supporting a workpiece that is to be scanned with a scanning optical system by means of a unidirectionally tracing light beam, transport means for allowing the drawing board and the scanning optical system to slide relative to each other in a direction that crosses the direction of beam tracing at right angles, a first and a second drive mechanism which are spaced apart in the tracing direction and which move one side of the drawing board in a direction parallel to the direction of the beam, tilt control means for inclining the drawing board with respect to the transport means by making the drive amount of the first drive means different from that of the second drive means, and translation control means for effecting a translational movement of the drawing board with respect to the transport means by making the drive amount of the first drive means equal to that of the second drive means.

    摘要翻译： 一种与扫描图形绘图装置一起使用的绘图表面调节机构，其不仅可以在垂直方向上移动绘图板，而且可以倾斜它，由此使得在扫描透镜的深度范围内的绘图表面的机会甚至增加 如果绘图表面在单个扫描鹳的宽度内具有波纹或其他缺陷。 本发明的拉伸面调整机构包括：用于通过单向跟踪光束用扫描光学系统支撑待扫描的工件的绘图板，用于允许绘图板和扫描光学系统相对滑动的传送装置 彼此沿着与直角的光束跟踪方向交叉的方向;第一和第二驱动机构，其在跟踪方向上间隔开，并且沿平行于所述方向的方向移动所述绘图板的一侧; 横梁，倾斜控制装置，用于通过使第一驱动装置的驱动量与第二驱动装置的驱动量不同而使绘图板相对于输送装置倾斜;以及平移控制装置，用于对绘图板进行平移运动 通过使第一驱动装置的驱动量等于第二驱动装置的驱动量来传送到传送装置。

    Liquid processing method and liquid processing apparatus
    10.
    发明授权
    Liquid processing method and liquid processing apparatus 有权
    液体处理方法和液体处理装置

    公开(公告)号：US09412627B2

    公开(公告)日：2016-08-09

    申请号：US13443057

    申请日：2012-04-10

    申请人： Jun Nonaka

    发明人： Jun Nonaka

    IPC分类号： B08B3/04 ,  H01L21/67 ,  H01L21/02

    CPC分类号： H01L21/67034 ,  H01L21/02052 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715

    摘要： A surface of a substrate can be dried cleanly after liquid-processed by a liquid processing method and a liquid processing apparatus. The liquid processing method includes forming a liquid film of a rinse solution on an entire surface of a substrate having thereon a hydrophobic region by supplying, onto a central portion of the surface of the substrate, the rinse solution for rinsing a chemical liquid supplied on the substrate at a first flow rate while rotating the substrate at a first rotation speed; forming a stripe-shaped flow of the rinse solution on the surface of the substrate by breaking the liquid film formed on the entire surface of the substrate; and moving a discharge unit configured to supply the rinse solution toward a periphery of the substrate until the stripe-shaped flow of the rinse solution is moved outside the surface of the substrate.

    摘要翻译： 通过液体处理方法和液体处理装置进行液体处理后，可以清洁基板的表面。 液体处理方法包括在其上具有疏水性区域的基板的整个表面上形成冲洗溶液的液膜，在基板的表面的中心部分上，供给冲洗液 基板以第一流速旋转，同时以第一转速旋转基板; 通过破坏形成在基板的整个表面上的液膜，在基板的表面上形成冲洗液的条状流; 并移动排出单元，该排出单元构造成朝向基板的周边供应冲洗溶液，直到冲洗溶液的条状流动移动到基板的表面之外。