Invention Grant
- Patent Title: Antistatic composition
- Patent Title (中): 防静电组成
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Application No.: US11885674Application Date: 2006-03-09
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Publication No.: US07629401B2Publication Date: 2009-12-08
- Inventor: Tetsuji Abe , Hiroaki Shirai , Takayuki Tsuda
- Applicant: Tetsuji Abe , Hiroaki Shirai , Takayuki Tsuda
- Applicant Address: JP Tokyo
- Assignee: Adeka Corporation
- Current Assignee: Adeka Corporation
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2005-071090 20050314
- International Application: PCT/JP2006/304593 WO 20060309
- International Announcement: WO2006/098214 WO 20060921
- Main IPC: C08K5/521
- IPC: C08K5/521 ; C08K5/06 ; C08K5/09

Abstract:
The present invention provides an antistatic composition including: a polymer (A) containing a monomer unit represented by the following general formula (1): where R1 represents a hydrocarbon group having a benzene ring, A represents a methyl group or an ethyl group, and a plurality of A's may be the same or different from each other, m and n, each of which is an average polymerization degree of an oxyalkylene group, each represent a numeral of 1 or more, and p represents a numeral of 2 or more; and a low-molecular-weight anionic compound (B).
Public/Granted literature
- US20080176979A1 Antistatic Composition Public/Granted day:2008-07-24
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