发明授权
- 专利标题: Fluid control device and method of manufacturing the same
- 专利标题(中): 流体控制装置及其制造方法
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申请号: US11676884申请日: 2007-02-20
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公开(公告)号: US07631769B2公开(公告)日: 2009-12-15
- 发明人: Tohru Den , Kazuhiko Fukutani
- 申请人: Tohru Den , Kazuhiko Fukutani
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Canon USA Inc IP Div
- 优先权: JP2003-363129 20021213
- 主分类号: B01D71/02
- IPC分类号: B01D71/02 ; B01D41/04 ; C25D11/02 ; B01D63/08
摘要:
A fluid control device has very fine pores with an average diameter not greater than 10 nm and provides a large flux. The fluid control device comprises an anodized alumina film having fine pores and a silicon based micro-porous film having very fine pores and made from an AlSi mixed film and the fine pores and the very fine pores are at least partly linked with each other. The fluid control device is prepared from a film including at least an aluminum layer and an AlSi mixed film by forming an anodized alumina film having fine pores by way of an anodization process for the aluminum layer part and also forming a silicon based micro-porous film having very fine pores containing silicon as principal ingredient by way of an anodization process or etching process for the AlSi mixed film. The fluid control device can be used as filter or ultrafilter film that allows fluid and gas to pass through it.
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