发明授权
- 专利标题: Fabrication method of photomask-blank
- 专利标题(中): 光掩模坯料的制造方法
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申请号: US11545451申请日: 2006-10-11
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公开(公告)号: US07632609B2公开(公告)日: 2009-12-15
- 发明人: Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
- 申请人: Noriyasu Fukushima , Hiroki Yoshikawa , Hideo Kaneko , Yukio Inazuki
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner LLP
- 优先权: JP2005-308618 20051024; JP2005-308622 20051024
- 主分类号: G03F1/14
- IPC分类号: G03F1/14
摘要:
A susceptor having the most basic structure has a three-layer structure including a first and a second transparent quartz part and an opaque quartz part sandwiched therebetween. For example, the opaque quartz part is made of “foamed quartz”. In addition, the opacity of the opaque quartz part to flash light is determined to fall within an appropriate range based on the material or thickness of the opaque quartz part, taking into consideration the composition or thickness of a thin film formed on the substrate and various conditions concerning the energy of the irradiation light during flash light irradiation or the like. The stack structure may be composed of a stack of a plurality of opaque quartz layers having different opacities.
公开/授权文献
- US20070092807A1 Fabrication method of photomask-blank 公开/授权日:2007-04-26
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