发明授权
- 专利标题： Photoresist composition with antibacterial agent
- 专利标题（中）： 抗蚀剂组合物与抗菌剂
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申请号： US11492029申请日： 2006-07-25
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公开(公告)号： US07635552B2公开(公告)日： 2009-12-22
- 发明人: Ross W. Keesler , John J. Konrad , Roy H. Magnuson , Robert A. Sinicki
- 申请人： Ross W. Keesler , John J. Konrad , Roy H. Magnuson , Robert A. Sinicki
- 申请人地址： US NY Endicott
- 专利权人： Endicott Interconnect Technologies, Inc.
- 当前专利权人： Endicott Interconnect Technologies, Inc.
- 当前专利权人地址： US NY Endicott
- 代理机构： Hinman, Howard & Kattell
- 代理商 Lawrence R. Fraley; Mark Levy
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004
摘要：
A photoresist composition, e.g., a positive acting resist, for use in the formation of circuit patterns and the like on printed circuit boards and the like circuitized substrates, the photoresist composition including a quantity of silver therein in a sufficient amount to substantially prevent bacteria formation within said composition. A method of making the composition is also provided.
公开/授权文献
- US20080026316A1 Photoresist composition with antibacterial agent 公开/授权日：2008-01-31
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