发明授权
- 专利标题： Lithographic apparatus
- 专利标题（中）： 平版印刷设备
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申请号： US11252230申请日： 2005-10-18
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公开(公告)号： US07639345B2公开(公告)日： 2009-12-29
- 发明人: Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
- 申请人： Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/62
- IPC分类号： G03B27/62 ; G03B27/58
摘要：
The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.
公开/授权文献
- US20070085987A1 Lithographic apparatus 公开/授权日：2007-04-19