发明授权
- 专利标题： Determining transmittance of a photomask using optical metrology
- 专利标题（中）： 使用光学测量法确定光掩模的透射率
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申请号： US11639974申请日： 2006-12-14
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公开(公告)号： US07639375B2公开(公告)日： 2009-12-29
- 发明人: Sanjay Yedur , Shifang Li , Youxian Wen , Wei Liu , Hanyou Chu , Ying Ying Luo
- 申请人： Sanjay Yedur , Shifang Li , Youxian Wen , Wei Liu , Hanyou Chu , Ying Ying Luo
- 申请人地址： JP Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JP Tokyo
- 代理商 Manuel B. Madriaga
- 主分类号： G01B11/14
- IPC分类号： G01B11/14
摘要：
Transmittance of a photomask is determined using optical metrology. In particular, reflectance of a portion of the photomask is determined by directing an incident beam of light at the portion of the photomask. The reflectance is determined by measuring light diffracted from the portion of the photomask. One or more geometric features of the portion of the photomask are determined using the measured light diffracted from the portion of the photomask. A wave coupling is determined using the determined one or more geometric features of the portion of the photomask. The transmittance of the photomask is determined using the determined wave coupling and the determined reflectance of the portion of the photomask.
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