发明授权
- 专利标题: Nitride semiconductor laser element
- 专利标题(中): 氮化物半导体激光元件
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申请号: US11963825申请日: 2007-12-22
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公开(公告)号: US07646798B2公开(公告)日: 2010-01-12
- 发明人: Atsuo Michiue , Tomonori Morizumi , Hiroaki Takahashi
- 申请人: Atsuo Michiue , Tomonori Morizumi , Hiroaki Takahashi
- 申请人地址: JP Anan-shi
- 专利权人: Nichia Corporation
- 当前专利权人: Nichia Corporation
- 当前专利权人地址: JP Anan-shi
- 代理机构: Global IP Counselors, LLP
- 优先权: JP2006-356288 20061228; JP2007-323204 20071214
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A nitride semiconductor laser element comprises; a nitride semiconductor layer that includes a first nitride semiconductor layer, an active layer, and a second nitride semiconductor layer, and that has a cavity with end faces, and a protective film formed on at least one end face of the cavity, wherein the protective film is formed of a first film with a crystal structure that has the same axial orientation as that of the nitride semiconductor layer constituting the end face of the cavity, and a second film with a crystal structure that has a different axial orientation from that of the first film, in this order from the side of the end face.
公开/授权文献
- US20080181274A1 NITRIDE SEMICONDUCTOR LASER ELEMENT 公开/授权日:2008-07-31
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