Invention Grant
- Patent Title: Material composition for nano- and micro-lithography
- Patent Title (中): 纳米和微光刻的材料组成
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Application No.: US10598943Application Date: 2005-06-01
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Publication No.: US07648767B2Publication Date: 2010-01-19
- Inventor: Peng Fei Fu , Lingjie Jay Guo , Xing Cheng
- Applicant: Peng Fei Fu , Lingjie Jay Guo , Xing Cheng
- Applicant Address: US MI Midland
- Assignee: Dow Corning Corporation
- Current Assignee: Dow Corning Corporation
- Current Assignee Address: US MI Midland
- Agency: Howard & Howard Attorneys PLLC
- International Application: PCT/US2005/019340 WO 20050601
- International Announcement: WO2006/083284 WO 20060810
- Main IPC: B32B17/06
- IPC: B32B17/06 ; C08G59/68

Abstract:
A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.
Public/Granted literature
- US20070196589A1 Material composition for nano-and micro-lithography Public/Granted day:2007-08-23
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