发明授权
- 专利标题： Manufacturing process and apparatus therefor utilizing reducing gas
- 专利标题（中）： 利用还原气的制造方法及其装置
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申请号： US11536051申请日： 2006-09-28
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公开(公告)号： US07648901B2公开(公告)日： 2010-01-19
- 发明人: Ping Liang Tu , Deming Liu , Kui Kam Lam , Man Chung Raymond Ng
- 申请人： Ping Liang Tu , Deming Liu , Kui Kam Lam , Man Chung Raymond Ng
- 申请人地址： HK Hong Kong
- 专利权人： ASM Assembly Automation Ltd.
- 当前专利权人： ASM Assembly Automation Ltd.
- 当前专利权人地址： HK Hong Kong
- 代理机构： Ostrolenk Faber LLP
- 主分类号： H01L21/44
- IPC分类号： H01L21/44
摘要：
A manufacturing process and apparatus therefore are provided for processing an electronic device comprising oxidizable material during processing. The electronic device is located inside a chamber and is heated a processing temperature with a heater. A reductive atmosphere is created in the chamber by supplying a gas comprising glycolic acid vapor while processing the electronic device at the processing temperature.
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