Invention Grant
US07649217B2 Thin film field effect transistors having Schottky gate-channel junctions
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具有肖特基栅极 - 沟道结的薄膜场效应晶体管
- Patent Title: Thin film field effect transistors having Schottky gate-channel junctions
- Patent Title (中): 具有肖特基栅极 - 沟道结的薄膜场效应晶体管
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Application No.: US11909715Application Date: 2006-03-24
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Publication No.: US07649217B2Publication Date: 2010-01-19
- Inventor: Arash Takshi , John Madden
- Applicant: Arash Takshi , John Madden
- Agency: Oyen Wiggs Green & Mutala LLP
- International Application: PCT/CA2006/000445 WO 20060324
- International Announcement: WO2006/099744 WO 20060928
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
An active electronic device has drain and source electrodes that make ohmic conduct with a layer of a semiconductor. The semiconductor layer may be a thin layer of an organic or amorphous semiconductor. The drain and source electrodes are on a first face of the layer of semiconductor at locations that are spaced apart on either side of a channel. The device has a gate electrode on a second face of the layer of semiconductor adjacent to the channel. The gate electrode makes a Schottky contact with the semiconductor to produce a depletion region in the channel. The gate electrode may encapsulate the channel so that the channel is protected from contact with oxygen, water molecules or other materials in the environment. In some embodiments, the device has an additional gate electrode separated from the semiconductor layer by an insulating layer. Such embodiments combine features of OFETs and MESFETs.
Public/Granted literature
- US20080258137A1 Thin Film Field Effect Transistors Having Schottky Gate-Channel Junctions Public/Granted day:2008-10-23
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