发明授权
- 专利标题: Probe and method of manufacturing probe
- 专利标题(中): 探头和探头的制造方法
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申请号: US10591645申请日: 2005-03-03
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公开(公告)号: US07649369B2公开(公告)日: 2010-01-19
- 发明人: Katsuya Okumura , Toshihiro Yonezawa
- 申请人: Katsuya Okumura , Toshihiro Yonezawa
- 申请人地址: JP JP
- 专利权人: Octec Inc.,TOKYO Electron Limited
- 当前专利权人: Octec Inc.,TOKYO Electron Limited
- 当前专利权人地址: JP JP
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2004-063228 20040305
- 国际申请: PCT/JP2005/003609 WO 20050303
- 国际公布: WO2005/085877 WO 20050915
- 主分类号: G01R31/02
- IPC分类号: G01R31/02 ; G01R31/28
摘要:
In accordance with an increase in speed, a wiring structure has rapidly become more microscopic and thinner and a wiring layer has become extremely thin, and therefore, giving a contact load to a probe for the inspection as has been conventionally done causes damage to a wiring layer and an insulation layer because the probe penetrates not only the oxide film but also the wiring layer or because of a concentration stress from the probe. On the other hand, decreasing the contact load causes unstable continuity between the probe and an electrode pad.It is an object of the present invention to surely and stably inspect an object to be inspected by breaking an oxide film with a low stylus pressure.The present invention is a probe that comes into electrical contact with an object to be inspected when inspecting an electrical characteristic of the object to be inspected, the probe including: a probe main body having a contact portion that comes into contact with the object to be inspected; and a plurality of conductive materials having tip portions projecting from the contact portion of the probe main body.
公开/授权文献
- US20080036479A1 Probe and Method of Manufacturing Probe 公开/授权日:2008-02-14
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