发明授权
- 专利标题: Orienting, positioning, and forming nanoscale structures
- 专利标题(中): 定位,定位和形成纳米结构
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申请号: US12061777申请日: 2008-04-03
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公开(公告)号: US07651735B2公开(公告)日: 2010-01-26
- 发明人: Joy Cheng , Ho-Cheol Kim , Robert D. Miller
- 申请人: Joy Cheng , Ho-Cheol Kim , Robert D. Miller
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Schmeiser, Olsen & Watts
- 主分类号: B05D5/00
- IPC分类号: B05D5/00
摘要:
Methods and a structure. A first film of a first block copolymer is formed inside a trough integrally disposed on an energetically neutral surface layer of a substrate. Line-forming microdomains are assembled of the first block copolymer, and form first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. At least one microdomain is removed from the first film such that oriented structures remain in the trough oriented normal to the sidewalls and parallel to the surface layer. A second film of a second block copolymer is formed inside the trough. Line-forming microdomains are assembled of the second block copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. A second method and a structure are also provided.
公开/授权文献
- US20080233343A1 ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES 公开/授权日:2008-09-25
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