利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

87 条记录 (耗时 0.023 秒)

    Orienting, positioning, and forming nanoscale structures
    1.
    发明授权
    Orienting, positioning, and forming nanoscale structures 有权
    定位，定位和形成纳米结构

    公开(公告)号：US07651735B2

    公开(公告)日：2010-01-26

    申请号：US12061777

    申请日：2008-04-03

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    IPC分类号： B05D5/00

    CPC分类号： B29D22/00 ,  B33Y10/00 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08L53/00 ,  G03F7/0002 ,  Y10S977/70 ,  Y10S977/701 ,  Y10S977/712 ,  Y10S977/788 ,  Y10S977/932 ,  Y10T428/1393 ,  Y10T428/24132 ,  Y10T428/249921 ,  C08L2666/02 ,  C08L2666/24

    摘要： Methods and a structure. A first film of a first block copolymer is formed inside a trough integrally disposed on an energetically neutral surface layer of a substrate. Line-forming microdomains are assembled of the first block copolymer, and form first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. At least one microdomain is removed from the first film such that oriented structures remain in the trough oriented normal to the sidewalls and parallel to the surface layer. A second film of a second block copolymer is formed inside the trough. Line-forming microdomains are assembled of the second block copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. A second method and a structure are also provided.

    摘要翻译： 方法和结构。 第一嵌段共聚物的第一膜形成在整体设置在基材的能量中性表面层上的槽内。 线形成微区域由第一嵌段共聚物组装，并且在垂直于侧壁并平行于表面层的第一膜内形成第一自组装结构。 至少一个微区域从第一膜移除，使得定向结构保持在垂直于侧壁并平行于表面层的槽中。 在槽内形成第二嵌段共聚物的第二膜。 线形成微区域由第二嵌段共聚物组装，并且在第二膜中形成第二自组装结构，其定向垂直于取向结构并平行于侧壁。 还提供了第二种方法和结构。

    ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES
    2.
    发明申请
    ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES 有权
    定向，定位和形成纳米结构

    公开(公告)号：US20080233343A1

    公开(公告)日：2008-09-25

    申请号：US12061777

    申请日：2008-04-03

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    IPC分类号： B32B5/12 ,  B05D3/00

    CPC分类号： B29D22/00 ,  B33Y10/00 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08L53/00 ,  G03F7/0002 ,  Y10S977/70 ,  Y10S977/701 ,  Y10S977/712 ,  Y10S977/788 ,  Y10S977/932 ,  Y10T428/1393 ,  Y10T428/24132 ,  Y10T428/249921 ,  C08L2666/02 ,  C08L2666/24

    摘要： Methods and a structure. A first film of a first block copolymer is formed inside a trough integrally disposed on an energetically neutral surface layer of a substrate. Line-forming microdomains are assembled of the first block copolymer, and form first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. At least one microdomain is removed from the first film such that oriented structures remain in the trough oriented normal to the sidewalls and parallel to the surface layer. A second film of a second block copolymer is formed inside the trough. Line-forming microdomains are assembled of the second block copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. A second method and a structure are also provided.

    摘要翻译： 方法和结构。 第一嵌段共聚物的第一膜形成在整体设置在基材的能量中性表面层上的槽内。 线形成微区域由第一嵌段共聚物组装，并且在垂直于侧壁并平行于表面层的第一膜内形成第一自组装结构。 至少一个微区域从第一膜移除，使得定向结构保持在垂直于侧壁并平行于表面层的槽中。 在槽内形成第二嵌段共聚物的第二膜。 线形成微区域由第二嵌段共聚物组装，并且在第二膜中形成第二自组装结构，其定向垂直于取向结构并平行于侧壁。 还提供了第二种方法和结构。

    Orienting, positioning, and forming nanoscale structures
    3.
    发明授权
    Orienting, positioning, and forming nanoscale structures 有权
    定位，定位和形成纳米结构

    公开(公告)号：US07999160B2

    公开(公告)日：2011-08-16

    申请号：US11690295

    申请日：2007-03-23

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    IPC分类号： B05D3/06 ,  B32B3/30 ,  B82B3/00

    CPC分类号： B29D22/00 ,  B33Y10/00 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08L53/00 ,  G03F7/0002 ,  Y10S977/70 ,  Y10S977/701 ,  Y10S977/712 ,  Y10S977/788 ,  Y10S977/932 ,  Y10T428/1393 ,  Y10T428/24132 ,  Y10T428/249921 ,  C08L2666/02 ,  C08L2666/24

    摘要： A method. A first copolymer is provided. A substrate is provided having an energetically neutral surface layer with at least one trough integrally disposed thereon with sidewalls. A first film of the first copolymer is coated inside the trough. Line-forming microdomains are assembled of the first copolymer forming first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. The first and second polymer blocks are removed from the first film and oriented structures remain in the trough normal to the sidewalls and parallel to the surface layer. A second film of a second copolymer is coated inside the trough. Line-forming microdomains are assembled of the second copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. The third and fourth polymer blocks are removed, and at least one second oriented structure remains.

    摘要翻译： 一个方法。 提供第一共聚物。 提供具有能量中性的表面层的基底，其中至少一个槽与其一体地设置有侧壁。 第一共聚物的第一膜涂覆在槽内。 线形成微区由第一共聚物组装，该第一共聚物在垂直于侧壁的第一膜内平行于表面层形成第一自组装结构。 第一和第二聚合物嵌段从第一膜去除，并且取向结构保持在垂直于侧壁并平行于表面层的槽中。 第二共聚物的第二膜涂覆在槽内。 线形成微区由第二共聚物组装，并且在第二膜中形成第二自组装结构，该结构定向成垂直于取向结构并平行于侧壁。 去除第三和第四聚合物嵌段，并保留至少一个第二取向结构。

    ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES
    4.
    发明申请
    ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES 有权
    定向，定位和形成纳米结构

    公开(公告)号：US20080233323A1

    公开(公告)日：2008-09-25

    申请号：US11690295

    申请日：2007-03-23

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Robert D. Miller

    IPC分类号： B29D22/00 ,  B05D3/06

    CPC分类号： B29D22/00 ,  B33Y10/00 ,  B33Y80/00 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  C08L53/00 ,  G03F7/0002 ,  Y10S977/70 ,  Y10S977/701 ,  Y10S977/712 ,  Y10S977/788 ,  Y10S977/932 ,  Y10T428/1393 ,  Y10T428/24132 ,  Y10T428/249921 ,  C08L2666/02 ,  C08L2666/24

    摘要： A method. A first copolymer is provided. A substrate is provided having an energetically neutral surface layer with at least one trough integrally disposed thereon with sidewalls. A first film of the first copolymer is coated inside the trough. Line-forming microdomains are assembled of the first copolymer forming first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. The first and second polymer blocks are removed from the first film and oriented structures remain in the trough normal to the sidewalls and parallel to the surface layer. A second film of a second copolymer is coated inside the trough. Line-forming microdomains are assembled of the second copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. The third and fourth polymer blocks are removed, and at least one second oriented structure remains.

    摘要翻译： 一个方法。 提供第一共聚物。 提供具有能量中性的表面层的基底，其中至少一个槽与其一体地设置有侧壁。 第一共聚物的第一膜涂覆在槽内。 线形成微区由第一共聚物组装，该第一共聚物在垂直于侧壁的第一膜内平行于表面层形成第一自组装结构。 第一和第二聚合物嵌段从第一膜去除，并且取向结构保持在垂直于侧壁并平行于表面层的槽中。 第二共聚物的第二膜涂覆在槽内。 线形成微区由第二共聚物组装，并且在第二膜中形成第二自组装结构，该结构定向成垂直于取向结构并且平行于侧壁。 去除第三和第四聚合物嵌段，并保留至少一个第二取向结构。

    Forming surface features using self-assembling masks
    6.
    发明授权
    Forming surface features using self-assembling masks 有权
    使用自组装掩模形成表面特征

    公开(公告)号：US07828986B2

    公开(公告)日：2010-11-09

    申请号：US11926722

    申请日：2007-10-29

    申请人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    发明人： Joy Cheng ,  Mark W. Hart ,  Hiroshi Ito ,  Ho-Cheol Kim ,  Robert Miller

    IPC分类号： B44C1/22 ,  H01L21/302

    CPC分类号： H01L21/0337 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  H01L21/0271 ,  H01L21/0332

    摘要： A method. A combination is provided of a block copolymer and additional material. The copolymer includes a first block of a first polymer covalently bonded to a second block of a second polymer. The additional material is miscible with the first polymer. The first polymer includes polystyrene and the second polymer includes poly(ethylene oxide). A first layer including polydimethylglutarimide is adhered onto a surface of a substrate including a dielectric coated silicon wafer. A film is formed of the combination directly onto a surface of the first layer. Nanostructures of the additional material self-assemble within the first polymer block. The film and the first layer are simultaneously etched. The nanostructures have an etch rate lower than an etch rate of the block copolymer and lower than an etch rate of the first layer. Portions of the film are removed. Features remain on the surface of the first layer.

    摘要翻译： 一个方法。 提供了一种嵌段共聚物和另外的材料的组合。 共聚物包括共价键合到第二聚合物的第二嵌段的第一聚合物的第一嵌段。 附加材料与第一聚合物混溶。 第一聚合物包括聚苯乙烯，第二聚合物包括聚（环氧乙烷）。 包括聚二甲基戊二酰亚胺的第一层粘附到包括电介质涂覆的硅晶片的基材的表面上。 该组合物直接由第一层的表面形成。 附加材料的纳米结构在第一聚合物嵌段内自组装。 同时蚀刻膜和第一层。 纳米结构的蚀刻速率低于嵌段共聚物的蚀刻速率，并且低于第一层的蚀刻速率。 部分电影被删除。 特征保留在第一层的表面上。

    Method of Controlling Orientation of Domains in Block Copolymer Films
    7.
    发明申请
    Method of Controlling Orientation of Domains in Block Copolymer Films 有权
    控制嵌段共聚物膜中畴的取向的方法

    公开(公告)号：US20090181171A1

    公开(公告)日：2009-07-16

    申请号：US12060516

    申请日：2008-04-01

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    IPC分类号： B44C1/22 ,  C08F283/10 ,  B05D5/00

    CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

    摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

    摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。

    Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
    8.
    发明授权
    Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
    使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法

    公开(公告)号：US07521090B1

    公开(公告)日：2009-04-21

    申请号：US12060500

    申请日：2008-04-01

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    IPC分类号： B05D5/00

    CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

    摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

    摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。

    Method of controlling orientation of domains in block copolymer films
    10.
    发明授权
    Method of controlling orientation of domains in block copolymer films 失效
    控制嵌段共聚物膜中取向的方法

    公开(公告)号：US07763319B2

    公开(公告)日：2010-07-27

    申请号：US12013138

    申请日：2008-01-11

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    IPC分类号： B05D5/00 ,  B05D5/12

    CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

    摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

    摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。