发明授权
US07651831B2 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
有权
具有包含氟磺酰胺基团的聚合物的正性光致抗蚀剂组合物及其使用方法
- 专利标题： Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use
- 专利标题（中）： 具有包含氟磺酰胺基团的聚合物的正性光致抗蚀剂组合物及其使用方法
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申请号： US12136163申请日： 2008-06-10
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公开(公告)号： US07651831B2公开(公告)日： 2010-01-26
- 发明人: Wenjie Li , Pushkara Rao Varanasi
- 申请人： Wenjie Li , Pushkara Rao Varanasi
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理商 Steven Capella
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30
摘要：
A positive photoresist composition comprises a radiation sensitive acid generator, and a polymer that includes a first repeating unit derived from a sulfonamide monomer including a fluorosulfonamide functionality, a second repeating unit having a pendant acid-labile moiety, and a third repeating unit having a lactone functionality. The positive photoresist composition may be used to form patterned features on a substrate, such as those used in the manufacture of a semiconductor device.
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