Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
-
Application No.: US11699065Application Date: 2007-01-29
-
Publication No.: US07652249B2Publication Date: 2010-01-26
- Inventor: Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
- Applicant: Atsushi Takane , Mitsuji Ikeda , Satoru Yamaguchi , Yasuhiko Ozawa
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-047673 20060224
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00
Abstract:
A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.
Public/Granted literature
- US20080073526A1 Charged particle beam apparatus Public/Granted day:2008-03-27
Information query
