Invention Grant
- Patent Title: Tandem process chamber
- Patent Title (中): 串联处理室
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Application No.: US10680656Application Date: 2003-10-06
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Publication No.: US07655092B2Publication Date: 2010-02-02
- Inventor: Kevin Fairbairn , Jessica Barzilai , Hari K. Ponnekanti , W. N. (Nick) Taylor
- Applicant: Kevin Fairbairn , Jessica Barzilai , Hari K. Ponnekanti , W. N. (Nick) Taylor
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/00
Abstract:
The present invention provides an apparatus for vacuum processing generally comprising an enclosure having a plurality of isolated chambers formed therein, a gas distribution assembly disposed in each processing chamber, a gas source connected to the plurality of isolated chambers, and a power supply connected to each gas distribution assembly.
Public/Granted literature
- US20080105202A9 Tandem process chamber Public/Granted day:2008-05-08
Information query
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