发明授权
- 专利标题: Wafer level electro-optical semiconductor manufacture fabrication mechanism and a method for the same
- 专利标题(中): 晶圆级电光半导体制造机构及其制造方法
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申请号: US11041952申请日: 2005-01-26
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公开(公告)号: US07655997B2公开(公告)日: 2010-02-02
- 发明人: Bily Wang , Jonnie Chuang , Chuan-Fa Lin , Chi-Wen Hung
- 申请人: Bily Wang , Jonnie Chuang , Chuan-Fa Lin , Chi-Wen Hung
- 申请人地址: TW Hsin Chu
- 专利权人: Harvatek Corporation
- 当前专利权人: Harvatek Corporation
- 当前专利权人地址: TW Hsin Chu
- 代理机构: Kile Goekjian Reed & McManus PLLC
- 主分类号: H01L27/14
- IPC分类号: H01L27/14
摘要:
A wafer-level electro-optical semiconductor fabrication mechanism and method for the same which improves upon traditional electro-optical semiconductor grain packaging methods. The present invention electrically connects semiconductor grains to the grains on a top surface of a wafer, this is done by either screen-printing or steel board-printing solder or silver paste onto the wafer. After that, the wafer is processed using the following steps: processing the devices, bonding with wire, packaging the wafer and finally cutting the wafer. Using this method raises the production yield while production times and costs are reduced. The wafer-level electro-optical semiconductor fabrication mechanism comprises: a wafer, an electro-optical semiconductor grain and conductive materials.
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