发明授权
US07657863B2 Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatus 有权
模式区域值计算方法,邻近效应校正方法和带电粒子束写入方法和装置

Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatus
摘要:
A method for calculating area values of a pattern written by using a charged particle beam, includes virtually dividing a pattern into a plurality of mesh-like first square regions surrounded by first grids defined at intervals of a predetermined size, virtually dividing the pattern into a plurality of mesh-like second square regions surrounded by second grids defined at intervals of the predetermined size, wherein the second grids being positionally deviated from the first grids by a half of the predetermined size, distributing an area value of a sub-pattern in each of the second square regions to a plurality of apexes of each of the second square regions such that a center-of-gravity position of the sub-pattern does not change, wherein the sub-pattern being a part of the pattern, and outputting the distributed area values as area values, for correcting a proximity effect, defined at the center position of each of the first square regions.
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