Invention Grant
- Patent Title: Method and system for generating and reviewing a thin sample
- Patent Title (中): 用于生成和检查薄样本的方法和系统
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Application No.: US11861206Application Date: 2007-09-25
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Publication No.: US07659506B2Publication Date: 2010-02-09
- Inventor: Michal Avinun-Kalish , Jacob Levin , Dror Shemesh
- Applicant: Michal Avinun-Kalish , Jacob Levin , Dror Shemesh
- Applicant Address: IL Rehovot
- Assignee: Applied Materials, Israel, Ltd.
- Current Assignee: Applied Materials, Israel, Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Sonnenschein Nath & Rosenthal LLP
- Main IPC: G01N23/22
- IPC: G01N23/22

Abstract:
A system and method for generating a thin sample, the method includes: milling an intermediate section of a thin sample such as to enable an upper portion of the thin sample to tilt in relation to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed. A system and method for inspecting a thin sample, the method includes: A method for inspecting a thin sample, the method comprising: illuminating, by a charged particle beam, a tilted upper portion of a thin sample that is connected, via a milled intermediate section, to a lower portion of the thin sample; wherein the lower portion is connected to a wafer from which the thin sample was formed; and collecting particles and photons resulting from the illumination.
Public/Granted literature
- US20090078867A1 METHOD AND SYSTEM FOR GENERATING AND REVIEWING A THIN SAMPLE Public/Granted day:2009-03-26
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