公开(公告)号：US08709269B2

公开(公告)日：2014-04-29

申请号：US12103458

申请日：2008-04-15

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/08

CPC classification number: G01N1/32

Abstract: A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, in which the cross section comprises at least one first portion made of a first material and at least one second portion made of a second material; smoothing the cross section; performing gas assisted etching of the cross section so as generate a topography difference between the at least one first portion and the at least one second portion of the cross section; coating the cross section with a thin layer of conductive material; and obtaining an image of the cross section; wherein the milling, smoothing, performing, coating and obtaining are performed while the specimen is placed in a vacuum chamber.

Abstract translation: 一种用于获得试样横截面图像的方法和系统，该方法包括：研磨试样以暴露试样的横截面，其中横截面包括至少一个由第一部分制成的第一部分 材料和由第二材料制成的至少一个第二部分; 平滑横截面; 执行所述横截面的气体辅助蚀刻，以便在所述截面的所述至少一个第一部分和所述至少一个第二部分之间产生形貌差异; 用导电材料薄层涂覆横截面; 并获得横截面的图像; 其中在将样品放置在真空室中时进行研磨，平滑，执行，涂覆和获得。

公开(公告)号：US08361814B2

公开(公告)日：2013-01-29

申请号：US11350516

申请日：2006-02-09

Applicant: Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

Inventor： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

IPC: G01R31/26 ,  H01L21/66 ,  B08B3/00 ,  B08B5/00

CPC classification number: H01L22/12

Abstract: A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

Abstract translation: 一种用于评估工具的清洁度的方法，所述方法包括：接收晶片; 清洁晶圆; 将晶片放置在工具中预定的时间段; 从工具移除晶片，执行接触角测量并确定晶片的清洁度。

公开(公告)号：US07842930B2

公开(公告)日：2010-11-30

申请号：US11923421

申请日：2007-10-24

Applicant: Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

Inventor： Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

IPC: H01J37/28

CPC classification number: H01J37/244 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24465 ,  H01J2237/2802 ,  H01J2237/2804

Abstract: A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.

Abstract translation: 带电粒子检测器组件包括粒子检测器，该粒子检测器具有至少一个用于检测带电粒子的空间分布的至少一部分的粒子敏感区域，并用于产生与检测到的空间分布相关的二维光信号。 此外，图像导管具有耦合到粒子检测器的粒子敏感区域的输入端，用于将二维光信号传输到至少一个光学检测器。 此外，选择装置适于选择二维光信号的至少一部分。

公开(公告)号：US20090053395A1

公开(公告)日：2009-02-26

申请号：US12103458

申请日：2008-04-15

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: B05D5/12 ,  C23F1/00 ,  B05C11/00

CPC classification number: G01N1/32

Abstract: A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, whereas the cross section comprises at least one first portions made of a first material and at least one second portion made of a second material; smoothing the cross section; performing gas assisted etching of the cross section so as generate a topography difference between the at least one first portion and the at least one second portion of the cross section; coating the cross section with a thin layer of conductive material; and obtaining an image of the cross section; wherein the milling, smoothing, performing, coating and obtaining are preformed while the specimen is placed in a vacuumed chamber.

Abstract translation: 一种用于获得样本横截面图像的方法和系统，所述方法包括：铣削样本以暴露样本的横截面，而横截面包括由第一材料制成的至少一个第一部分 和由第二材料制成的至少一个第二部分; 平滑横截面; 执行所述横截面的气体辅助蚀刻，以便在所述截面的所述至少一个第一部分和所述至少一个第二部分之间产生形貌差异; 用导电材料薄层涂覆横截面; 并获得横截面的图像; 其中在将样品放置在真空室中时进行研磨，平滑化，涂覆和获得。

公开(公告)号：US07473911B2

公开(公告)日：2009-01-06

申请号：US10695620

申请日：2003-10-27

Applicant: Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

Inventor： Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

IPC: H01J49/44

CPC classification number: H01L22/34 ,  H01J37/32935 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L2924/3011

Abstract: A method for process monitoring includes receiving a sample having a first layer that is at least partly conductive and a second layer formed over the first layer, following production of contact openings in the second layer. A beam of charged particles is directed along a beam axis that deviates substantially in angle from a normal to a surface of the sample, so as to irradiate one or more of the contact openings in each of a plurality of locations distributed over at least a region of the sample. A specimen current flowing through the first layer is measured in response to irradiation of the one or more of the contact openings at each of the plurality of locations. A map of at least the region of the sample is created, indicating the specimen current measured in response to the irradiation at the plurality of the locations.

Abstract translation: 一种用于过程监测的方法包括在第二层中产生接触开口之后，接收具有至少部分导电的第一层的样品和在第一层上形成的第二层。 带电粒子束沿着光束轴线被引导，所述光束轴线基本上偏离于与样品表面的法线的角度，以便照射分布在至少一个区域上的多个位置中的每一个中的一个或多个接触开口 的样品。 响应于多个位置中的每一个处的一个或多个接触开口的照射来测量流过第一层的样本电流。 产生至少样品区域的图，指示响应于多个位置处的照射测量的样本电流。

公开(公告)号：US20080234962A1

公开(公告)日：2008-09-25

申请号：US11877125

申请日：2007-10-23

Applicant: Dror Shemesh ,  Yuri Shirman

Inventor： Dror Shemesh ,  Yuri Shirman

IPC: G06F19/00

CPC classification number: G01N23/2276

Abstract: A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter; and an interface to a electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.

Abstract translation: 一种用于提供经补偿的俄歇频谱的系统，所述系统包括：处理器，适于响应于未补偿的俄歇频谱并响应于电位相关参数产生经补偿的俄歇频谱; 以及与适于检测从第一区域发射的电子的电子检测器的接口，其中该接口连接到该处理器，并且其中该电位相关参数反映由该第一区域照射的该物体的第一区域的状态 在产生非补偿俄歇光谱期间的带电粒子束。

公开(公告)号：US20050012050A1

公开(公告)日：2005-01-20

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/21 ,  A61N5/00 ,  G01N21/00 ,  G21G5/00 ,  H01J3/26 ,  H01J37/08 ,  H01J37/153 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US07847267B2

公开(公告)日：2010-12-07

申请号：US10502104

申请日：2003-10-22

Applicant: Dror Shemesh ,  Pavel Adamec

Inventor： Dror Shemesh ,  Pavel Adamec

IPC: H01J37/244

CPC classification number: H01J37/244 ,  G01N23/2251 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.

Abstract translation: 一种用于电子的多检测器检测的系统和方法，该方法包括以下步骤：通过列引导一次电子束与检测对象相互作用，通过引入实质的静电场来引导从检查的反射或散射的电子 物体朝向多个内部检测器，而至少一些定向电子相对于被检查物体以小角度反射或散射; 以及从至少一个内部检测器接收检测信号。

公开(公告)号：US07683317B2

公开(公告)日：2010-03-23

申请号：US11532465

申请日：2006-09-15

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J40/00 ,  H01J47/00

CPC classification number: H01J37/28 ,  H01J2237/057

Abstract: A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes a stage for supporting an object that comprises an opaque layer positioned above an intermediate layer; a controller, adapted to receive or define an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illumination optics adapted to illuminate the object with a primary electron beam; an electron spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor, coupled to the spectrometer, adapted to generate images from detection signals provided by the spectrometer.

Abstract translation: 一种用于检测隐藏的缺陷和图案的方法，所述方法包括：接收包含位于中间层上方的不透明层的对象; 响应于不透明层的至少一个特性和扫描电子显微镜的至少一个特征限定能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，其包括用于支撑物体的台，所述台包括位于中间层上方的不透明层; 控制器，适于响应于所述不透明层的至少一个特性和扫描电子显微镜的至少一个特性接收或限定能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的电子光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及耦合到所述光谱仪的处理器，适于从由所述光谱仪提供的检测信号产生图像。

公开(公告)号：US20080258060A1

公开(公告)日：2008-10-23

申请号：US11923407

申请日：2007-10-24

Applicant: JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

Inventor： JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC: G01N23/00

CPC classification number: H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

Abstract translation: 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。