公开(公告)号：US07847267B2

公开(公告)日：2010-12-07

申请号：US10502104

申请日：2003-10-22

申请人： Dror Shemesh ,  Pavel Adamec

发明人： Dror Shemesh ,  Pavel Adamec

IPC分类号： H01J37/244

CPC分类号： H01J37/244 ,  G01N23/2251 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

摘要： A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.

摘要翻译： 一种用于电子的多检测器检测的系统和方法，该方法包括以下步骤：通过列引导一次电子束与检测对象相互作用，通过引入实质的静电场来引导从检查的反射或散射的电子 物体朝向多个内部检测器，而至少一些定向电子相对于被检查物体以小角度反射或散射; 以及从至少一个内部检测器接收检测信号。

公开(公告)号：US07683317B2

公开(公告)日：2010-03-23

申请号：US11532465

申请日：2006-09-15

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： H01J40/00 ,  H01J47/00

CPC分类号： H01J37/28 ,  H01J2237/057

摘要： A method for detecting hidden defects and patterns, the method includes: receiving an object that comprises an opaque layer positioned above an intermediate layer; defining an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illuminating the object with a primary electron beam; and generating images from electrons that arrive to a spectrometer having an energy within the energy band. A scanning electron microscope that includes a stage for supporting an object that comprises an opaque layer positioned above an intermediate layer; a controller, adapted to receive or define an energy band in response to at least one characteristic of the opaque layer and at least one characteristic of a scanning electron microscope; illumination optics adapted to illuminate the object with a primary electron beam; an electron spectrometer, controlled by the controller such as to selectively reject electrons in response to the defined energy band; and a processor, coupled to the spectrometer, adapted to generate images from detection signals provided by the spectrometer.

摘要翻译： 一种用于检测隐藏的缺陷和图案的方法，所述方法包括：接收包含位于中间层上方的不透明层的对象; 响应于不透明层的至少一个特性和扫描电子显微镜的至少一个特征限定能带; 用一次电子束照射物体; 以及从到达具有能带内的能量的光谱仪的电子产生图像。 一种扫描电子显微镜，其包括用于支撑物体的台，所述台包括位于中间层上方的不透明层; 控制器，适于响应于所述不透明层的至少一个特性和扫描电子显微镜的至少一个特性接收或限定能带; 适于用一次电子束照射物体的照明光学器件; 由控制器控制的电子光谱仪，以便响应于限定的能带选择性地拒绝电子; 以及耦合到所述光谱仪的处理器，适于从由所述光谱仪提供的检测信号产生图像。

公开(公告)号：US20080258060A1

公开(公告)日：2008-10-23

申请号：US11923407

申请日：2007-10-24

申请人： JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

发明人： JUERGEN FROSIEN ,  Helmut Banzhof ,  Jacob Levin ,  Dror Shemesh

IPC分类号： G01N23/00

CPC分类号： H01J37/1478 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/1506 ,  H01J2237/2448 ,  H01J2237/26 ,  H01J2237/2806 ,  H01J2237/31745 ,  H01J2237/31749

摘要： A charged particle beam apparatus is provided, which comprises a charged particle beam column for generating a primary charged particle beam; a focusing assembly, such as a charged particle lens, e.g., an electrostatic lens, for focusing the primary charged particle beam on a specimen; a detector for detecting charged signal particles which are emerging from the specimen; and a deflector arrangement for deflecting the primary charged particle beam. The deflector arrangement is arranged downstream of the focusing assembly and is adapted for allowing the charged signal particles passing therethrough. The detector is laterally displaced with respect to the optical axis in a deflection direction defined by the post-focusing deflector arrangement.

摘要翻译： 提供带电粒子束装置，其包括用于产生初级带电粒子束的带电粒子束柱; 聚焦组件，例如带电粒子透镜，例如静电透镜，用于将初级带电粒子束聚焦在样本上; 用于检测从样本出现的带电信号颗粒的检测器; 以及用于偏转初级带电粒子束的偏转器装置。 偏转器布置布置在聚焦组件的下游，并且适于允许带电信号颗粒通过其中。 检测器在由后聚焦偏转器布置限定的偏转方向上相对于光轴横向移位。

公开(公告)号：US20080191134A1

公开(公告)日：2008-08-14

申请号：US11923421

申请日：2007-10-24

申请人： Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

发明人： Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

IPC分类号： G01N23/00 ,  G01T1/00

CPC分类号： H01J37/244 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24465 ,  H01J2237/2802 ,  H01J2237/2804

摘要： A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.

摘要翻译： 带电粒子检测器组件包括粒子检测器，该粒子检测器具有至少一个用于检测带电粒子的空间分布的至少一部分的粒子敏感区域，并用于产生与检测到的空间分布相关的二维光信号。 此外，图像导管具有耦合到粒子检测器的粒子敏感区域的输入端，用于将二维光信号传输到至少一个光学检测器。 此外，选择装置适于选择二维光信号的至少一部分。

公开(公告)号：US07297965B2

公开(公告)日：2007-11-20

申请号：US11119207

申请日：2005-04-28

申请人： Eitan Kidron ,  Dror Shemesh

发明人： Eitan Kidron ,  Dror Shemesh

IPC分类号： G21K5/10

CPC分类号： G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

摘要翻译： 公开了用于形成物体样品的方法和装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过性分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的方法。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US20060054811A1

公开(公告)日：2006-03-16

申请号：US10530178

申请日：2003-10-08

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： G01N23/2252

摘要： Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions include a system and method for process monitoring that analyze a cavity before being filled and then analyze emitted X-rays from the cavity after the cavity has been filled with a conductive material. Also included are system and methods for process monitoring that apply a quantitative analysis correction technique on detected X-ray emissions.

摘要翻译： 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法包括用于过程监测的系统和方法，其在填充之前分析空腔，然后分析来自腔的发射的X射线 空腔已经填充有导电材料。 还包括用于过程监测的系统和方法，其应用定量分析校正技术检测X射线发射。

公开(公告)号：US20060011868A1

公开(公告)日：2006-01-19

申请号：US11119207

申请日：2005-04-28

申请人： Eitan Kidron ,  Dror Shemesh

发明人： Eitan Kidron ,  Dror Shemesh

IPC分类号： G21K5/10

CPC分类号： G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

摘要翻译： 公开了用于形成物体样品的方法和装置，从物体中提取样品，并对该样品进行微量分析，包括真空室中的表面分析和电子透过性分析。 在一些实施例中，提供了用于对提取的样品的物体横截面进行成像的方法。 任选地，将样品迭代地稀释并在真空室内成像。 在一些实施例中，样品位于包括任选孔的样品支架上。 可选地，样品位于样品载体的表面上，使得物体横截面基本上平行于样品载体的表面。 一旦安装在样品支架上，样品就可以在真空室中进行微量分析，或者加载到装载站上。 在一些实施例中，用基本上正常地入射到物体横截面表面的电子束成像样品。

公开(公告)号：US20060011867A1

公开(公告)日：2006-01-19

申请号：US11119230

申请日：2005-08-18

申请人： Eitan Kidron ,  Dror Shemesh

发明人： Eitan Kidron ,  Dror Shemesh

IPC分类号： H01J37/08

CPC分类号： G01N1/32 ,  H01J37/185 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/204 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

摘要： Methods and apparatus are disclosed for forming a sample of an object, extracting the sample from the object, and subjecting this sample to microanalysis including surface analysis and electron transparency analysis in a vacuum chamber. In some embodiments, a method is provided for imaging an object cross section surface of an extracted sample. Optionally, the sample is iteratively thinned and imaged within the vacuum chamber. In some embodiments, the sample is situated on a sample support including an optional aperture. Optionally, the sample is situated on a surface of the sample support such that the object cross section surface is substantially parallel to the surface of the sample support. Once mounted on the sample support, the sample is either subjected to microanalysis in the vacuum chamber, or loaded onto a loading station. In some embodiments, the sample is imaged with an electron beam substantially normally incident to the object cross section surface.

公开(公告)号：US08709269B2

公开(公告)日：2014-04-29

申请号：US12103458

申请日：2008-04-15

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： H01J37/08

CPC分类号： G01N1/32

摘要： A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, in which the cross section comprises at least one first portion made of a first material and at least one second portion made of a second material; smoothing the cross section; performing gas assisted etching of the cross section so as generate a topography difference between the at least one first portion and the at least one second portion of the cross section; coating the cross section with a thin layer of conductive material; and obtaining an image of the cross section; wherein the milling, smoothing, performing, coating and obtaining are performed while the specimen is placed in a vacuum chamber.

摘要翻译： 一种用于获得试样横截面图像的方法和系统，该方法包括：研磨试样以暴露试样的横截面，其中横截面包括至少一个由第一部分制成的第一部分 材料和由第二材料制成的至少一个第二部分; 平滑横截面; 执行所述横截面的气体辅助蚀刻，以便在所述截面的所述至少一个第一部分和所述至少一个第二部分之间产生形貌差异; 用导电材料薄层涂覆横截面; 并获得横截面的图像; 其中在将样品放置在真空室中时进行研磨，平滑，执行，涂覆和获得。

公开(公告)号：US08361814B2

公开(公告)日：2013-01-29

申请号：US11350516

申请日：2006-02-09

申请人： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

发明人： Dror Shemesh ,  Michal Eilon ,  Hen Doozli ,  Ekaterina Rechav ,  Eitan Binyamini

IPC分类号： G01R31/26 ,  H01L21/66 ,  B08B3/00 ,  B08B5/00

CPC分类号： H01L22/12

摘要： A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.

摘要翻译： 一种用于评估工具的清洁度的方法，所述方法包括：接收晶片; 清洁晶圆; 将晶片放置在工具中预定的时间段; 从工具移除晶片，执行接触角测量并确定晶片的清洁度。