发明授权
US07662669B2 Method of exposing circuit lateral interconnect contacts by wafer saw
有权
通过晶片锯暴露电路横向互连触点的方法
- 专利标题: Method of exposing circuit lateral interconnect contacts by wafer saw
- 专利标题(中): 通过晶片锯暴露电路横向互连触点的方法
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申请号: US11782488申请日: 2007-07-24
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公开(公告)号: US07662669B2公开(公告)日: 2010-02-16
- 发明人: Patty Pei-Ling Chang-Chien , Kelly Jill Tornquist Hennig , Ken Wai-Kin Ho , Ann Kent-Ming Ho
- 申请人: Patty Pei-Ling Chang-Chien , Kelly Jill Tornquist Hennig , Ken Wai-Kin Ho , Ann Kent-Ming Ho
- 申请人地址: US CA Los Angeles
- 专利权人: Northrop Grumman Space & Mission Systems Corp.
- 当前专利权人: Northrop Grumman Space & Mission Systems Corp.
- 当前专利权人地址: US CA Los Angeles
- 代理机构: Miller IP Group. PLC
- 代理商 John A. Miller
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A method for fabricating wafer-level packages including lateral interconnects. The method includes precutting a cover wafer at the locations where the cover wafer will be completely cut through to separate the wafer-level packages. The cover wafer is bonded to the substrate wafer using bonding rings so as to seal the integrated circuit within a cavity between the cover wafer and the substrate wafer, where the precuts face the substrate wafer. The cover wafer is then cut at the precut locations to remove the unwanted portions of the cover wafer between the packages and expose contacts or probe pads for the lateral interconnects. The substrate wafer is then cut between the wafer-level packages to separate the packages.
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