发明授权
US07662993B2 Synthesis of [13C] and [2H] substituted methacrylic acid, [13C] and [2H] substituted methyl methacrylate and/or related compounds
失效
[13 C]和[2H]取代的甲基丙烯酸的合成[13 C]和[2H]取代的甲基丙烯酸甲酯和/或相关化合物
![Synthesis of [13C] and [2H] substituted methacrylic acid, [13C] and [2H] substituted methyl methacrylate and/or related compounds](/docs/US/2010-02-16/US07662993B2/abs.jpg.600x600.jpg)
- 专利标题： Synthesis of [13C] and [2H] substituted methacrylic acid, [13C] and [2H] substituted methyl methacrylate and/or related compounds
- 专利标题（中）： [13 C]和[2H]取代的甲基丙烯酸的合成[13 C]和[2H]取代的甲基丙烯酸甲酯和/或相关化合物
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申请号： US11591828申请日： 2006-11-02
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公开(公告)号： US07662993B2公开(公告)日： 2010-02-16
- 发明人: Marc A. Alvarez , Rodolfo A. Martinez , Clifford J. Unkefer
- 申请人： Marc A. Alvarez , Rodolfo A. Martinez , Clifford J. Unkefer
- 申请人地址： US NM Los Alamos
- 专利权人： Los Alamos National Security, LLC
- 当前专利权人： Los Alamos National Security, LLC
- 当前专利权人地址： US NM Los Alamos
- 代理商 Bruce H. Cottrell
- 主分类号： C07C317/12
- IPC分类号： C07C317/12 ; C07C321/22
![Synthesis of [13C] and [2H] substituted methacrylic acid, [13C] and [2H] substituted methyl methacrylate and/or related compounds](/abs-image/US/2010/02/16/US07662993B2/abs.jpg.150x150.jpg)
摘要：
The present invention is directed to labeled compounds of the formulae wherein Q is selected from the group consisting of —S(═O)—, and —S(═O)2—, Z is selected from the group consisting of 1-naphthyl, substituted 1-naphthyl, 2-naphthyl, substituted 2-naphthyl, and phenyl groups with the structure wherein R1, R2, R3, R4 and R5 are each independently selected from the group consisting of hydrogen, a C1-C4 lower alkyl, a halogen, and an amino group selected from the group consisting of NH2, NHR and NRR′ where R and R′ are each independently selected from the group consisting of a C1-C4 lower alkyl, an aryl, and an alkoxy group, and X is selected from the group consisting of hydrogen, a C1-C4 lower alkyl group, and a fully-deuterated C1-C4 lower alkyl group.
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