发明授权
- 专利标题： Gas monitoring apparatus and gas monitoring method
- 专利标题（中）： 气体监测仪和气体监测方法
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申请号： US11704351申请日： 2007-02-09
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公开(公告)号： US07663098B2公开(公告)日： 2010-02-16
- 发明人: Yasuo Seto , Isaac Ohsawa , Hiroshi Sekiguchi , Hisashi Maruko , Yasuaki Takada , Akihiko Okumura , Hidehiro Okada , Hisashi Nagano , Izumi Waki
- 申请人： Yasuo Seto , Isaac Ohsawa , Hiroshi Sekiguchi , Hisashi Maruko , Yasuaki Takada , Akihiko Okumura , Hidehiro Okada , Hisashi Nagano , Izumi Waki
- 申请人地址： JP Tokyo
- 专利权人： Hitachi, Ltd.
- 当前专利权人： Hitachi, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Antonelli, Terry, Stout & Kraus, LLP.
- 优先权： JP2006-237892 20060901
- 主分类号： H01J49/00
- IPC分类号： H01J49/00 ; G01N1/22
摘要：
A gas monitoring apparatus capable of real-time detection of a kind of chemical warfare agent, namely diphenylcyanoarsine (DC) and/or diphenylchloroarsine (DA). Atmospheric pressure chemical ionization mass spectrometry is carried out in the positive ionization mode, the total amount of DC and DA is determined from the intensity of an ion common to DC and DA, the DC concentration is determined from the intensity of an ion specific to DC, and the difference between them is regarded as the DA concentration.
公开/授权文献
- US20080054172A1 Gas monitoring apparatus and gas monitoring method 公开/授权日：2008-03-06