Invention Grant
- Patent Title: Seal ring corner design
- Patent Title (中): 密封圈角设计
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Application No.: US11245339Application Date: 2005-10-05
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Publication No.: US07663159B2Publication Date: 2010-02-16
- Inventor: Xian J. Ning
- Applicant: Xian J. Ning
- Applicant Address: CN Shanghai
- Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
- Current Assignee Address: CN Shanghai
- Agency: Townsend and Townsend and Crew LLP
- Priority: CN200510030304 20050928
- Main IPC: H01L29/74
- IPC: H01L29/74

Abstract:
Techniques for an integrated circuit device are provided. The integrated circuit device includes a substrate, an active circuit area, and a dielectric layer. A seal ring surrounds the active circuit area. At least one corner area of the integrated circuit includes a plurality of corner band stacks. Each of the plurality of corner band stacks is oriented at about a predetermined angle and extends from a first sawing trace to a second sawing trace. In a specific embodiment, if a structural fault in the at least one corner area occurs, the structural fault is predisposed to extend at about the predetermined angle.
Public/Granted literature
- US20070069336A1 Seal ring corner design Public/Granted day:2007-03-29
Information query
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