发明授权
- 专利标题: Erosion-resistant components for plasma process chambers
- 专利标题(中): 等离子体处理室的耐腐蚀组件
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申请号: US09892212申请日: 2001-06-25
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公开(公告)号: US07670688B2公开(公告)日: 2010-03-02
- 发明人: Tony S. Kaushal , You Wang , Ananda H. Kumar
- 申请人: Tony S. Kaushal , You Wang , Ananda H. Kumar
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Mayer & Williams PC
- 代理商 David B. Bonham, Esq.; Keum J. Park, Esq.
- 主分类号: B32B15/04
- IPC分类号: B32B15/04 ; B32B9/00 ; C23C16/00
摘要:
An erosion-resistant article for use as a component in plasma process chamber. The erosion-resistant article comprises a support and an oxide coating comprising yttrium, which is disposed over the support. The support and the oxide coating preferably have material compositions that differ from one another in coefficient of thermal expansion by no more than 5×10−6/K. Preferred oxide coating compositions include yttria and yttrium aluminum garnet. Preferred supports include alumina supports and aluminum-silicon carbide supports.
公开/授权文献
- US20040033385A1 Erosion-resistant components for plasma process chambers 公开/授权日:2004-02-19
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