发明授权
- 专利标题: Thermal treatment system instrument rack and method of selectively thermally treating medical instrument portions
- 专利标题(中): 热处理系统仪器架和选择性热处理医疗器械部分的方法
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申请号: US11320645申请日: 2005-12-30
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公开(公告)号: US07671302B1公开(公告)日: 2010-03-02
- 发明人: Durward I. Faries, Jr. , Bruce R. Heymann , David Hendrix
- 申请人: Durward I. Faries, Jr. , Bruce R. Heymann , David Hendrix
- 申请人地址: US VA Chantilly
- 专利权人: O. R. Solutions, Inc.
- 当前专利权人: O. R. Solutions, Inc.
- 当前专利权人地址: US VA Chantilly
- 代理机构: Edell, Shapiro & Finnan, LLC
- 主分类号: A61B19/00
- IPC分类号: A61B19/00 ; A61F7/00 ; F27D11/00
摘要:
A system according to the present invention includes a cabinet, a basin positioned within the cabinet to contain and thermally treat a liquid bath, and a support assembly that stabilizes a surgical scope. The support assembly may include a first support that elevates scope optics above the liquid bath within the basin, and a second support that positions the shaft of the scope within the liquid bath, but above the floor and away from the walls of the basin. The scope optics resides outside of the bath in a dry state, while the remaining scope portions are positioned within the bath so the portions can be thermally treated. The support assembly enables a user to warm selected portions of the scope, while protecting the scope, the basin, and/or a drape lining the basin from damage caused when the scope contacts the basin.
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