Invention Grant
- Patent Title: Method of making diode having reflective layer
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Application No.: US11203322Application Date: 2005-08-15
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Publication No.: US07682854B2Publication Date: 2010-03-23
- Inventor: Myung Cheol Yoo
- Applicant: Myung Cheol Yoo
- Applicant Address: KR Seoul
- Assignee: LG Electronics Inc.
- Current Assignee: LG Electronics Inc.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method of forming a light emitting diode includes forming a transparent substrate and a GaN buffer layer on the transparent substrate. An n-GaN layer is formed on the buffer layer. An active layer is formed on the n-GaN layer. A p-GaN layer is formed on the active layer. A p-electrode is formed on the p-GaN layer and an n-electrode is formed on the n-GaN layer. A reflective layer is formed on a second side of the transparent substrate. A scribe line is formed on the substrate for separating the diodes on the substrate. Also, a cladding layer of AlGaN is between the p-GaN layer and the active layer.
Public/Granted literature
- US20060006400A1 Method of making diode having reflective layer Public/Granted day:2006-01-12
Information query
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