发明授权
- 专利标题: Transistor
- 专利标题(中): 晶体管
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申请号: US11758304申请日: 2007-06-05
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公开(公告)号: US07683399B2公开(公告)日: 2010-03-23
- 发明人: Hidetoshi Ishida , Tsuyoshi Tanaka , Daisuke Ueda
- 申请人: Hidetoshi Ishida , Tsuyoshi Tanaka , Daisuke Ueda
- 申请人地址: JP Osaka
- 专利权人: Panasonic Corporation
- 当前专利权人: Panasonic Corporation
- 当前专利权人地址: JP Osaka
- 代理机构: Greenblum & Bernstein P.L.C.
- 优先权: JP2006-157776 20060606
- 主分类号: H01L31/0328
- IPC分类号: H01L31/0328
摘要:
There is provided a normally-off type transistor made of a nitride semiconductor. The transistor includes; an undoped GaN layer which forms a channel region; an undoped Al0.2Ga0.8N layer which is formed on the undoped GaN layer and has a band gap larger than that of the undoped GaN layer; a p-type Al0.2Ga0.8N control layer which is formed on the undoped Al0.2Ga0.8N layer, has a p-type conductivity and forms a control region; an Ni gate electrode which contacts with the p-type Al0.2Ga0.8N control layer; a Ti/Al source electrode and a Ti/Al drain electrode which are formed beside the p-type Al0.2Ga0.8N control layer; and an Ni ohmic electrode which is connected to the undoped GaN layer and serves as a hole absorbing electrode. With this transistor, it is possible to achieve a large-current operation and a high switching speed.
公开/授权文献
- US20070278521A1 TRANSISTOR 公开/授权日:2007-12-06
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