发明授权
- 专利标题: Simulation apparatus and simulation method used to design characteristics and circuits of semiconductor device, and semiconductor device fabrication method
- 专利标题(中): 用于设计半导体器件特性和电路的仿真设备和仿真方法,以及半导体器件制造方法
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申请号: US11776730申请日: 2007-07-12
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公开(公告)号: US07685543B2公开(公告)日: 2010-03-23
- 发明人: Hiroshi Tsuji , Yoshiteru Shimizu
- 申请人: Hiroshi Tsuji , Yoshiteru Shimizu
- 申请人地址: JP Yokohama-shi
- 专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人: Advanced LCD Technologies Development Center Co., Ltd.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2006-202195 20060725
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
Disclosed is a simulation apparatus including an input unit, storage unit, arithmetic unit, controller, and output unit. The input unit inputs a first potential at the source end, which corresponds to the gate end of a TFT, on that surface of a thin polysilicon film which faces the gate, a second potential at the source end on the back surface of the thin polysilicon film on which the gate is formed, a third potential at the drain end, which corresponds to the gate end of the TFT, on that surface of the thin polysilicon film which faces the gate, and a fourth potential at the drain end on the back surface of the thin polysilicon film. A drain current is calculated by performing an arithmetic operation on the basis of the first to fourth potentials, and a model is formed by including defect states.
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