发明授权
US07685543B2 Simulation apparatus and simulation method used to design characteristics and circuits of semiconductor device, and semiconductor device fabrication method 失效
用于设计半导体器件特性和电路的仿真设备和仿真方法,以及半导体器件制造方法

Simulation apparatus and simulation method used to design characteristics and circuits of semiconductor device, and semiconductor device fabrication method
摘要:
Disclosed is a simulation apparatus including an input unit, storage unit, arithmetic unit, controller, and output unit. The input unit inputs a first potential at the source end, which corresponds to the gate end of a TFT, on that surface of a thin polysilicon film which faces the gate, a second potential at the source end on the back surface of the thin polysilicon film on which the gate is formed, a third potential at the drain end, which corresponds to the gate end of the TFT, on that surface of the thin polysilicon film which faces the gate, and a fourth potential at the drain end on the back surface of the thin polysilicon film. A drain current is calculated by performing an arithmetic operation on the basis of the first to fourth potentials, and a model is formed by including defect states.
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