Invention Grant
- Patent Title: Method for producing laminated dielectric
- Patent Title (中): 叠层电介质的制造方法
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Application No.: US11282835Application Date: 2005-11-21
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Publication No.: US07687015B2Publication Date: 2010-03-30
- Inventor: Shotaro Watanabe , Yasuko Osaki , Naoyuki Tsuda , Kazunari Watanabe
- Applicant: Shotaro Watanabe , Yasuko Osaki , Naoyuki Tsuda , Kazunari Watanabe
- Applicant Address: JP Tokyo
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-137579 20040506
- Main IPC: C04B35/64
- IPC: C04B35/64 ; C03C14/00

Abstract:
A method for producing a laminated dielectric, which comprises laminating a raw material layer containing a high dielectric constant glass ceramic composition comprising from 30 to 70 mass % of a Ba—Ti compound powder having a Ti/Ba molar ratio of from 3.0 to 5.7 and from 30 to 70 mass % of an alkali free glass powder containing, by mol %, from 15 to 40% of SiO2, from 5 to 37% of B2O3, from 2 to 15% of Al2O3, from 1 to 25% of CaO+SrO, from 5 to 25% of BaO and from 25 to 50% of SiO2+Al2O3, and a raw material layer containing a low dielectric constant glass ceramic composition comprising from 10 to 70 mass % of a ceramic powder and from 30 to 90 mass % of an alkali free glass powder wherein SiO2+Al2O3 is at least 34 mol % and larger by at least 9 mol % than that in the above alkali free glass powder, followed by firing.
Public/Granted literature
- US20060075782A1 Method for producing laminated dielectric Public/Granted day:2006-04-13
Information query
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