发明授权
US07687860B2 Semiconductor device including impurity regions having different cross-sectional shapes
有权
包括具有不同横截面形状的杂质区域的半导体器件
- 专利标题: Semiconductor device including impurity regions having different cross-sectional shapes
- 专利标题(中): 包括具有不同横截面形状的杂质区域的半导体器件
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申请号: US11425444申请日: 2006-06-21
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公开(公告)号: US07687860B2公开(公告)日: 2010-03-30
- 发明人: Woon-Kyung Lee , Jeong-Hyuk Choi , Dong-Jun Lee , Jai-Hyuk Song
- 申请人: Woon-Kyung Lee , Jeong-Hyuk Choi , Dong-Jun Lee , Jai-Hyuk Song
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Myers Bigel Sibley & Sajovec, P.A.
- 优先权: KR10-2005-0055227 20050624; KR10-2006-0021439 20060307
- 主分类号: H01L21/8239
- IPC分类号: H01L21/8239
摘要:
There are provided a memory transistor having a select transistor with asymmetric gate electrode structure and an inverted T-shaped floating gates and a method for forming the same. A gate electrode of the select transistor adjacent to a memory transistor has substantially an inverted T-shaped figure, whereas the gate electrode of the select transistor opposite to the memory transistor has nearly a box-shaped figure. In order to form the floating gate of the memory transistor in shape of the inverted T, a region for the select transistor is closed when opening a region for the memory transistor.
公开/授权文献
- US20060292802A1 Semiconductor Device and Method for Forming the Same 公开/授权日:2006-12-28
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