Invention Grant
US07687860B2 Semiconductor device including impurity regions having different cross-sectional shapes
有权
包括具有不同横截面形状的杂质区域的半导体器件
- Patent Title: Semiconductor device including impurity regions having different cross-sectional shapes
- Patent Title (中): 包括具有不同横截面形状的杂质区域的半导体器件
-
Application No.: US11425444Application Date: 2006-06-21
-
Publication No.: US07687860B2Publication Date: 2010-03-30
- Inventor: Woon-Kyung Lee , Jeong-Hyuk Choi , Dong-Jun Lee , Jai-Hyuk Song
- Applicant: Woon-Kyung Lee , Jeong-Hyuk Choi , Dong-Jun Lee , Jai-Hyuk Song
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2005-0055227 20050624; KR10-2006-0021439 20060307
- Main IPC: H01L21/8239
- IPC: H01L21/8239

Abstract:
There are provided a memory transistor having a select transistor with asymmetric gate electrode structure and an inverted T-shaped floating gates and a method for forming the same. A gate electrode of the select transistor adjacent to a memory transistor has substantially an inverted T-shaped figure, whereas the gate electrode of the select transistor opposite to the memory transistor has nearly a box-shaped figure. In order to form the floating gate of the memory transistor in shape of the inverted T, a region for the select transistor is closed when opening a region for the memory transistor.
Public/Granted literature
- US20060292802A1 Semiconductor Device and Method for Forming the Same Public/Granted day:2006-12-28
Information query
IPC分类: