Invention Grant
- Patent Title: Controlling substrate surface properties via colloidal coatings
- Patent Title (中): 通过胶体涂层控制底物表面性能
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Application No.: US11729644Application Date: 2007-03-29
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Publication No.: US07687890B2Publication Date: 2010-03-30
- Inventor: Gopalakrishnan Subramanian , Nirupama Chakrapani , Larry DeCesare , Shripad Gokhale , Jason Murphy , Jinlin Wang
- Applicant: Gopalakrishnan Subramanian , Nirupama Chakrapani , Larry DeCesare , Shripad Gokhale , Jason Murphy , Jinlin Wang
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Caven & Aghevli LLC
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L21/00
Abstract:
Methods and apparatus to control surface properties via colloidal coatings are described. In one embodiment, colloidal coating may be used on a surface to enhance flow control. Other embodiments are also described.
Public/Granted literature
- US20080237810A1 Controlling substrate surface properties via colloidal coatings Public/Granted day:2008-10-02
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