Invention Grant
US07692801B2 Optical stacked structure inspecting method and optical stacked structure inspecting apparatus 失效
光学层叠结构检查方法和光学堆叠结构检查装置

  • Patent Title: Optical stacked structure inspecting method and optical stacked structure inspecting apparatus
  • Patent Title (中): 光学层叠结构检查方法和光学堆叠结构检查装置
  • Application No.: US11415293
    Application Date: 2006-05-02
  • Publication No.: US07692801B2
    Publication Date: 2010-04-06
  • Inventor: Yuki Nakamura
  • Applicant: Yuki Nakamura
  • Applicant Address: JP Tokyo
  • Assignee: Ricoh Company, Ltd.
  • Current Assignee: Ricoh Company, Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Dickstein Shapiro LLP
  • Priority: JP2005-134949 20050506
  • Main IPC: G01B11/28
  • IPC: G01B11/28
Optical stacked structure inspecting method and optical stacked structure inspecting apparatus
Abstract:
An inspecting method inspects an optical stacked structure having a reflection layer and at least one light transmitting thin film sequentially stacked on a substrate. The inspecting method irradiates inspection light on the optical stacked structure from a side provided with the light transmitting thin film, measures a light intensity of reflected light from each layer, that changes depending on a change in an optical path length to each layer, and inspects a thickness of the light transmitting thin film based on the light intensity of reflected light for a specific wavelength.
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