Invention Grant
- Patent Title: Optical stacked structure inspecting method and optical stacked structure inspecting apparatus
- Patent Title (中): 光学层叠结构检查方法和光学堆叠结构检查装置
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Application No.: US11415293Application Date: 2006-05-02
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Publication No.: US07692801B2Publication Date: 2010-04-06
- Inventor: Yuki Nakamura
- Applicant: Yuki Nakamura
- Applicant Address: JP Tokyo
- Assignee: Ricoh Company, Ltd.
- Current Assignee: Ricoh Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Dickstein Shapiro LLP
- Priority: JP2005-134949 20050506
- Main IPC: G01B11/28
- IPC: G01B11/28

Abstract:
An inspecting method inspects an optical stacked structure having a reflection layer and at least one light transmitting thin film sequentially stacked on a substrate. The inspecting method irradiates inspection light on the optical stacked structure from a side provided with the light transmitting thin film, measures a light intensity of reflected light from each layer, that changes depending on a change in an optical path length to each layer, and inspects a thickness of the light transmitting thin film based on the light intensity of reflected light for a specific wavelength.
Public/Granted literature
- US20060285121A1 Optical stacked structure inspecting method and optical stacked structure inspecting apparatus Public/Granted day:2006-12-21
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