发明授权
- 专利标题: Substrate processing system and method of controlling the same
- 专利标题(中): 基板处理系统及其控制方法
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申请号: US11472358申请日: 2006-06-22
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公开(公告)号: US07694649B2公开(公告)日: 2010-04-13
- 发明人: Yoshio Kimura , Takahiro Okubo
- 申请人: Yoshio Kimura , Takahiro Okubo
- 申请人地址: JP Tokyo-To
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo-To
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2005-184296 20050624
- 主分类号: B05C11/00
- IPC分类号: B05C11/00 ; B05C13/02 ; B05B7/06 ; B05B17/00
摘要:
A process system includes a plurality of processing modules each processing a substrate with a process liquid. There is disposed a dispensing mechanism that dispenses the process liquid to the vertically arranged modules. The dispensing mechanism is provided with a process liquid supply source, and pumps corresponding to the respective processing modules. Each pump temporarily stores therein the process liquid which has been pressure-fed through a riser piping from the process liquid supply source by a pressing apparatus, and delivers the process liquid from an outlet. There are disposed nozzles each having a discharge port and discharging the process liquid to the corresponding processing module. Delivery pipings connecting the outlets of the pumps with the discharge ports of the corresponding nozzles have identical length to each other.
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