发明授权
- 专利标题: Method for producing a chip card contact zone
- 专利标题(中): 芯片卡接触区的制造方法
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申请号: US11560058申请日: 2006-11-15
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公开(公告)号: US07694888B2公开(公告)日: 2010-04-13
- 发明人: Frank Pueschner , Wolfgang Schindler , Peter Stampka
- 申请人: Frank Pueschner , Wolfgang Schindler , Peter Stampka
- 申请人地址: DE Neubiberg
- 专利权人: Infineon Technologies AG
- 当前专利权人: Infineon Technologies AG
- 当前专利权人地址: DE Neubiberg
- 代理机构: Dickstein, Shapiro, LLP.
- 优先权: DE102005054418 20051115
- 主分类号: G06K19/06
- IPC分类号: G06K19/06
摘要:
A method for producing a contact zone for a chip card has the following steps. A sheet having a first surface and a second surface opposite the first surface. Forming at least one insulating trench, which extends from the first surface to the second surface. A cluster layer is applied to the first surface. The second surface is connected to a carrier element after the cluster layer has been applied to the first surface.
公开/授权文献
- US20070148859A1 METHOD FOR PRODUCING A CHIP CARD CONTACT ZONE 公开/授权日:2007-06-28
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