Invention Grant
- Patent Title: Semiconductor devices and methods of manufacturing thereof
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US11371544Application Date: 2006-03-09
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Publication No.: US07696019B2Publication Date: 2010-04-13
- Inventor: Jin-Ping Han
- Applicant: Jin-Ping Han
- Applicant Address: DE Munich
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Munich
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Semiconductor devices and methods of manufacturing thereof are disclosed. A preferred embodiment includes a semiconductor device comprising a workpiece, the workpiece including a first region and a second region proximate the first region. A first material is disposed in the first region, and at least one region of a second material is disposed within the first material in the first region, the second material comprising a different material than the first material. The at least one region of the second material increases a first stress of the first region.
Public/Granted literature
- US20070210301A1 Semiconductor devices and methods of manufacturing thereof Public/Granted day:2007-09-13
Information query
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