发明授权
- 专利标题: Method of manufacturing device
- 专利标题(中): 制造装置的方法
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申请号: US12354542申请日: 2009-01-15
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公开(公告)号: US07696067B2公开(公告)日: 2010-04-13
- 发明人: Masaru Nakamura , Hirokazu Matsumoto
- 申请人: Masaru Nakamura , Hirokazu Matsumoto
- 申请人地址: JP Tokyo
- 专利权人: Disco Corporation
- 当前专利权人: Disco Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Greer, Burns & Crain, Ltd.
- 优先权: JP2008-020336 20080131
- 主分类号: H01L21/30
- IPC分类号: H01L21/30
摘要:
A method of manufacturing a device includes: a laser beam-machined groove forming step of irradiating a wafer with a laser beam from the back side of the wafer along planned dividing lines so as to form laser beam-machined grooves along the planned dividing lines; an etching step of etching a back-side surface of the wafer having been subjected to the laser beam-machined groove forming step, so as to remove denatured layers formed at processed surfaces of the laser beam-machined grooves; an adhesive film attaching step of attaching an adhesive film to the back-side surface of the wafer having been subjected to the etching step, and adhering the adhesive film side of the wafer to a surface of a dicing tape; and an adhesive film rupturing step of expanding the dicing tape so as to rupture the adhesive film along individual devices.
公开/授权文献
- US20090197395A1 METHOD OF MANUFACTURING DEVICE 公开/授权日:2009-08-06
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