发明授权
- 专利标题： Phenolic/alicyclic copolymers and photoresists
- 专利标题（中）： 酚醛/脂环族共聚物和光致抗蚀剂
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申请号： US10313954申请日： 2002-12-06
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公开(公告)号： US07700256B2公开(公告)日： 2010-04-20
- 发明人: George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
- 申请人： George G. Barclay , Ashish Pandya , Wang Yueh , Anthony Zampini , Gary Ganghui Teng , Zhibiao Mao
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： US MA Marlborough
- 代理机构： Edwards Angell Palmer & Dodge LLP
- 代理商 Peter F. Corless; Darryl P. Frickey
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30
摘要：
The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
公开/授权文献
- US20030207200A1 Phenolic/alicyclic copolymers and photoresists 公开/授权日：2003-11-06
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