发明授权
US07709967B2 Shapes-based migration of aluminum designs to copper damascene 失效
基于形状的铝设计迁移到铜镶嵌

Shapes-based migration of aluminum designs to copper damascene
摘要:
An interconnect structure, method of fabricating the interconnect structure and method of designing the interconnect structure for use in semiconductor devices. The interconnect structure includes a damascene metal wire having a pattern of dielectric filled holes.
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