发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11882292申请日： 2007-07-31
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公开(公告)号： US07710541B2公开(公告)日： 2010-05-04
- 发明人: Helmar Van Santen , Aleksey Kolesnychenko
- 申请人： Helmar Van Santen , Aleksey Kolesnychenko
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/52
摘要：
A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
公开/授权文献
- US20080186459A1 Lithographic apparatus and device manufacturing method 公开/授权日：2008-08-07
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