发明授权
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
-
申请号: US11512432申请日: 2006-08-30
-
公开(公告)号: US07714306B2公开(公告)日: 2010-05-11
- 发明人: Johannes Hubertus Josephina Moors , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人: Johannes Hubertus Josephina Moors , Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury, Winthrop Shaw Pittman, LLP
- 主分类号: G21K5/10
- IPC分类号: G21K5/10
摘要:
A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.
公开/授权文献
- US20080054189A1 Lithographic apparatus and device manufacturing method 公开/授权日:2008-03-06