发明授权
- 专利标题: Method and apparatus for detecting pattern defects
- 专利标题(中): 检测图案缺陷的方法和装置
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申请号: US11319271申请日: 2005-12-29
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公开(公告)号: US07720275B2公开(公告)日: 2010-05-18
- 发明人: Hisae Shibuya , Akira Hamamatsu , Yuji Takagi
- 申请人: Hisae Shibuya , Akira Hamamatsu , Yuji Takagi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2005-085381 20050324
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G06K9/62
摘要:
With the objective of achieving defect kind training in a short period of time to teach classification conditions of defects detected as a result of inspecting a thin film device, according to one aspect of the present invention, there is provided a visual inspection method, and an apparatus therefore, comprising the steps of: detecting defects based on inspection images acquired by optical or electronic defect detection means, and at the same time calculating features of the defects; and classifying the defects according to classification conditions set beforehand, wherein said classification condition setting step further includes the steps of: collecting defect features over a large number of defects acquired beforehand from the defect detection step; sampling defects based on the distribution of the collected defect features over the large number of defects; and setting defect classification conditions based on the result of reviewing the sampled defects.
公开/授权文献
- US20060215902A1 Method and apparatus for detecting pattern defects 公开/授权日:2006-09-28
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