发明授权
US07724361B2 Apparatus and method of inspecting defects in photomask and method of fabricating photomask
有权
检查光掩模中的缺陷的装置和方法以及制造光掩模的方法
- 专利标题： Apparatus and method of inspecting defects in photomask and method of fabricating photomask
- 专利标题（中）： 检查光掩模中的缺陷的装置和方法以及制造光掩模的方法
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申请号： US11293306申请日： 2005-12-05
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公开(公告)号： US07724361B2公开(公告)日： 2010-05-25
- 发明人: Junichi Tanaka
- 申请人： Junichi Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Hoya Corporation
- 当前专利权人： Hoya Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JPP2004-353249 20041206
- 主分类号： G01N21/00
- IPC分类号： G01N21/00
摘要：
A mura-defect inspection apparatus 10 includes: a light source 12 which irradiates light onto a photomask 50 having a repeated pattern that a unit pattern is regularly arranged on a surface 52A of a transparent substrate 52; and a light receiving member 13 which receives reflected light from the photomask to convert it to received light data, wherein an analyzer 14 analyzes the received light data to detect a mura-defect generated in the repeated pattern, wherein the light source 12 irradiates light onto a back side 52B of the transparent substrate in the photomask.