发明授权
- 专利标题: Aligner and self-cleaning method for aligner
- 专利标题(中): 对准器的对准器和自清洁方法
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申请号: US11285211申请日: 2005-11-23
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公开(公告)号: US07733460B2公开(公告)日: 2010-06-08
- 发明人: Ryoichi Aoyama , Daigo Hoshino , Toshio Onodera , Yasuhiro Yamamoto
- 申请人: Ryoichi Aoyama , Daigo Hoshino , Toshio Onodera , Yasuhiro Yamamoto
- 申请人地址: JP Tokyo
- 专利权人: Oki Semiconductor Co., Ltd.
- 当前专利权人: Oki Semiconductor Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Rabin & Berdo, P.C.
- 优先权: JP2004-338573 20041124
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42
摘要:
When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays are reflected by the reflecting plate, diffused, and emitted onto the surface of a condenser lens, thereby breaking down and removing contaminants that are adhered to the surface of the condenser lens. The light rays also enter the interior of the condenser lens to clean away contaminants that are adhered to locations other than a normal exposure path. When a concave mirror and/or a reflecting plate having 50% transmittance is used as the reflecting plate, the emission range of the light rays (i.e., the locations that are cleaned) can be changed.
公开/授权文献
- US20070240735A1 Aligner and self-cleaning method for aligner 公开/授权日:2007-10-18
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