发明授权
- 专利标题: Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus
- 专利标题(中): 光学性能恢复装置,恢复方法以及该装置中使用的光学系统
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申请号: US11682794申请日: 2007-03-06
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公开(公告)号: US07733563B2公开(公告)日: 2010-06-08
- 发明人: Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
- 申请人: Satoshi Sakai , Shigenori Tsuruga , Hideo Yamakoshi , Shizuma Kuribayashi , Minoru Danno , Hiroshi Futami , Noriko Yamazaki
- 申请人地址: JP Tokyo
- 专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人: Mitsubishi Heavy Industries, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 主分类号: G02B5/20
- IPC分类号: G02B5/20
摘要:
An optical system has fluoride compounds provided in an environment exposed by vacuum ultraviolet light or plasma light, which has higher photon energy than an absorption wavelength of a base stock of the optical system. 1-layer of a protective film of SiO2 or metal oxides having a film thickness of 2-20 nm is formed at least on the light irradiation side (inner side) of the optical system to prevent the stripping of the fluorine atoms from the surface of the optical system. In addition, the protective film is a 1-layer film selected from one of SiO2, MgO, TiO2, or ZrO2.